Electron Beam Lithography

We have acquired electron-beam writing capabilities with the installation of a modified scanning electron microscope (JEOL 6600) equipped with a RAITH interferometric stage, which allows automatic alignment and stitching on up to 2” wafers. This tool is used to define structures and devices at sub-micrometer scale, for photonic and nanoelectronic applications.

Nanimprint Lithography

We have recently acquired a nanoimprint lithography (NIL) system for the replication of patterns in the micro- and nanometer range on up to 6" substrates (Obducat, Eitre6). This system offers a complete range of imprint methods, including thermal NIL, hot embossing, UV NIL, as well as a proprietary Simultanous Thermal and UV (STU) imprint process.

Nanyang NanoFabrication Centre

The Nanyang Nano-Fabrication Centre (N2FC) houses state-of-the-art nano-fabrication facilities to provide university-wide support for nanoscience and nanotechnology research. It comprises of two cleanrooms, Cleanroom 1 (CR1) and Cleanroom 2 (CR2), and a MOCVD laboratory:
- CR1 is a class 100 cleanroom, with an area of 673 m2. It houses tools for 6 inch CMOS line as well as other tools for non-CMOS work.
- CR2 is a class 10 and class 100 cleanroom, with an area of 693 m2. It is dedicated to non-CMOS work.